With focus on Semiconductor Industry.
Material development for Semiconductor Industry for Logic, Power, Photonics, Quantum. SemiCopilot brings AI-native intelligence to SiC and GaN fabs - compressing yield cycles, accelerating materials discovery, and putting Europe at the frontier of next-generation power semiconductor production.
The world’s transition to clean energy, electric mobility, and advanced defense electronics runs on material development. Silicon carbide and gallium nitride are no longer emerging materials - they are the backbone of the next industrial era. Yet the fabs producing them still depend on manual process expertise, fragmented toolchains, and slow empirical iteration. Every yield loss is measured in hundreds of thousands of euros. Every delayed qualification is a missed market window.
Building AI based physics simulation software for semiconductor manufacturing.
Headquartered in Germany and embedded in Europe.
Advanced Material Applications in Semiconductor Industry
Silicon (Si)
SiC / GaN / GaAs
SiPh / InP / LiNbO3
Diamond / Sapphire
Our AI based Semiconductor physics simulation software utilizes existing fab data, connecting not only physics simulated data but also process parameters, equipment states, and wafer metrology, to predict and prevent yield loss before it occurs. No new hardware. No operational disruption. Pure software intelligence layered onto what fabs already have.
Qualifying a new material (SiC, GaN, LiNb03, Diamond, Sapphire) variant through conventional experimentation takes years. Our AI guided discovery platform replaces trial-and-error cycles with predictive screening, cutting qualification timelines from years to months and dramatically reducing R&D cost per innovation cycle.
SemiCopilot is purpose-built for the European compound semiconductor ecosystem. CRMA-aligned, GDPR-compliant, and anchored in EU regulatory frameworks. Our platform supports EU Chips Act industrial goals and integrates with European pilot line and RTO infrastructure. Data stays within European borders - by architecture, not just by policy.
The Semiconductor AI Platform
Semi Copilot provides physics-informed AI models for plasma behavior and surface evolution in semiconductor etching processes. Plasma models take inputs such as precursor gases (SF₆, C₄F₈, Cl₂, BCl₃, C₄F₈+O₂), power configurations (ICP, CCP), pressure, and chamber geometry, and predict key outputs including Ion Energy Distribution Functions (IEDF), ion flux, and electron density profiles. These outputs are tightly coupled with surface topography models that simulate material-specific etch behavior across Si, SiO₂, SiC, and GaN. The platform captures critical KPIs such as etch rate, anisotropy, selectivity, and CD bias. By combining AI with DFT/MD-informed surface kinetics, it enables predictive control of etch profiles and defect mechanisms across complex multi-step recipes.
Our AI models for MOCVD growth processes, specifically tuned for compound semiconductors such as GaN. The models take precursor inputs such as TMGa, NH₃, and dopant sources like ferrocene (Fe), SiH₄, or Cp₂Mg, along with reactor conditions including temperature, pressure, and flow dynamics. The system predicts growth rates, doping concentrations, and impurity incorporation profiles across the wafer. It further models interface quality KPIs such as dislocation density, surface roughness, and buffer layer resistivity. These insights enable optimization of GaN buffer layers, HEMT structures, and hetero-interfaces for high-performance RF and power devices.
Semi Copilot enables AI-driven modeling of photolithography processes for advanced logic and emerging 2D semiconductor materials. The models take inputs such as photoresist chemistry, exposure dose, wavelength, and etch compatibility constraints to predict pattern fidelity and defect formation. Special focus is given to chemical incompatibilities and damage mechanisms in sensitive materials like MoS₂ and other 2D layers. The system identifies risks such as resist residue interaction, plasma-induced damage, and line-edge roughness. This allows engineers to co-optimize lithography and downstream processes for defect-free pattern transfer in next-generation device architectures.
Material development sit at the core of electrification, clean energy, and sovereign defense electronics. SemiCopilot’s two product lines address the full production intelligence stack - from materials design to fab- floor yield.
Getting a new material (SiC, GaN, Diamond, Sapphire etc) variant from lab synthesis to production-qualified status can take three to five years of iterative physical experimentation. Semi Copilot simulates the Electrical, Topography, Optical, Thermal and Mechchanical properties instantly through the power of our pretrained AI algorithms for a given material and a given device geometry, and accordingly gives the most optimal recipe to run inside the Fab.
Explore MaterialsAI
Advanced-age semiconductor fabs operate at the edge of process complexity. A single defect cluster in SiC epitaxy, an uncontrolled doping gradient, or a mistimed anneal step can cascade into wafer-level yield loss worth hundreds of thousands of euros per run. As opposed to the industry’s current response (manual engineering intuition and reactive process corrections), Semi Copilot gives you a very accurate and reliable Process/Equipment Development.
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NTU Taiwan
IIT Bombay • Serial Entrepreneur
UC Santa Barbara
TU Dresden • TU Munich
Connecting with the heart of European semiconductor innovation. Reach out to us directly or visit one of our offices.